Title :

Impact of Thermal Stress on Device Physics and Morphology in Organic Photodetectors

Author(s) :

Luong, Hoang Mai [Auteur]
Chae, Sangmin [Auteur]
Yi, Ahra [Auteur]
Ding, Kan [Auteur]
Huang, Jianfei [Auteur]
Kim, Brian Minki [Auteur]
Welton, Claire [Auteur]
Unité de Catalyse et Chimie du Solide - UMR 8181 [UCCS]
Chen, Jingcong [Auteur]
Wakidi, Hiba [Auteur]
Du, Zhifang [Auteur]
Kim, Hyo Jung [Auteur]
Ade, Harald [Auteur]
Reddy, Manjunatha [Auteur]
Unité de Catalyse et Chimie du Solide (UCCS) - UMR 8181
Nguyen, Thuc-Quyen [Auteur]

Journal title :

ACS Energy Letters

Abbreviated title :

ACS Energy Lett.

Volume number :

8

Pages :

2130-2140

Publisher :

American Chemical Society (ACS)

Publication date :

2023-04-11

HAL domain(s) :

Chimie/Chimie inorganique

English abstract : [en]

Organic photodetectors (OPDs) capable of detecting visible to near-infrared light provide a ubiquitous platform for emerging flexible and wearable electronics. In the process of implementing OPDs into a Si-based manufacturing ...
Show more >Organic photodetectors (OPDs) capable of detecting visible to near-infrared light provide a ubiquitous platform for emerging flexible and wearable electronics. In the process of implementing OPDs into a Si-based manufacturing process, organic semiconductors undergo ≥ 200 °C thermal stress, leading to the deterioration of photosensing capability. Here, we combine multiscale characterization and device physics to unravel the impact of thermal stress on the optoelectronics characteristics of PTB7-Th:non-fullerene acceptor blends (NFAs: SiOTIC-4F, COTIC-4F, CO1-4F, and CO1-4Cl). For as-cast devices, favorable intermixing and phase separation between PTB7-Th and the NFA facilitate charge generation and extraction. Reductions in the OPD performance after thermal annealing (200 °C for 5–120 min) are observed due to the morphological degradation, regardless of the NFA choice, but the reduction is more severe for the PTB7-Th:SiOTIC-4F blend. Thermally induced morphological changes are examined using atomic force microscopy, wide-angle X-ray scattering, and solid-state NMR spectroscopy. This study provides essential insights into morphology-driven deteriorations, which will help in developing structure–stability–performance relationships in high detectivity OPDs.Show less >

Language :

Anglais

Audience :

Internationale

Popular science :

Non

Administrative institution(s) :

Université de Lille
CNRS
Centrale Lille
ENSCL
Univ. Artois

Collections :

• Unité de Catalyse et Chimie du Solide (UCCS) - UMR 8181

Research team(s) :

RMN et matériaux inorganiques (RM2I)

Submission date :

2024-04-03T13:48:23Z