Temperature-sensitivity of two microwave ...
Document type :
Article dans une revue scientifique
Title :
Temperature-sensitivity of two microwave HEMT devices: AlGaAs/GaAs vs. AlGaN/GaN heterostructures
Author(s) :
Alim, Mohammad Abdul [Auteur]
Chowdhury, Abu Zahed [Auteur]
Islam, Shariful [Auteur]
Gaquière, Christophe [Auteur]
Puissance - IEMN [PUISSANCE - IEMN]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Crupi, Giovanni [Auteur]
University of Messina
Chowdhury, Abu Zahed [Auteur]
Islam, Shariful [Auteur]
Gaquière, Christophe [Auteur]
Puissance - IEMN [PUISSANCE - IEMN]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Crupi, Giovanni [Auteur]
University of Messina
Journal title :
Electronics
Pages :
1115
Publisher :
MDPI
Publication date :
2021-05-09
ISSN :
2079-9292
English keyword(s) :
Temperature-sensitivity
Microwave performance
High electron-mobility transistor (HEMT)
GaAs
GaN
Heterostructure
Microwave performance
High electron-mobility transistor (HEMT)
GaAs
GaN
Heterostructure
HAL domain(s) :
Sciences de l'ingénieur [physics]
English abstract : [en]
The goal of this paper is to provide a comparative analysis of the thermal impact on the microwave performance of high electron-mobility transistors (HEMTs) based on GaAs and GaN technologies. To accomplish this challenging ...
Show more >The goal of this paper is to provide a comparative analysis of the thermal impact on the microwave performance of high electron-mobility transistors (HEMTs) based on GaAs and GaN technologies. To accomplish this challenging goal, the relative sensitivity of the microwave performance to changes in the ambient temperature is determined by using scattering parameter measurements and the corresponding equivalent-circuit models. The studied devices are two HEMTs with the same gate width of 200 µm but fabricated using different semiconductor materials: GaAs and GaN technologies. The investigation is performed under both cooled and heated conditions, by varying the temperature from −40 °C to 150 °C. Although the impact of the temperature strongly depends on the selected operating condition, the bias point is chosen in order to enable, as much as possible, a fair comparison between the two different technologies. As will be shown, quite similar trends are observed for the two different technologies, but the impact of the temperature is more pronounced in the GaN device.Show less >
Show more >The goal of this paper is to provide a comparative analysis of the thermal impact on the microwave performance of high electron-mobility transistors (HEMTs) based on GaAs and GaN technologies. To accomplish this challenging goal, the relative sensitivity of the microwave performance to changes in the ambient temperature is determined by using scattering parameter measurements and the corresponding equivalent-circuit models. The studied devices are two HEMTs with the same gate width of 200 µm but fabricated using different semiconductor materials: GaAs and GaN technologies. The investigation is performed under both cooled and heated conditions, by varying the temperature from −40 °C to 150 °C. Although the impact of the temperature strongly depends on the selected operating condition, the bias point is chosen in order to enable, as much as possible, a fair comparison between the two different technologies. As will be shown, quite similar trends are observed for the two different technologies, but the impact of the temperature is more pronounced in the GaN device.Show less >
Language :
Anglais
Peer reviewed article :
Oui
Audience :
Internationale
Popular science :
Non
Source :
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