Size and shape control of a variety of ...
Type de document :
Compte-rendu et recension critique d'ouvrage
Titre :
Size and shape control of a variety of metallic nanostructures using tilted, rotating evaporation and lithographic lift-off techniques
Auteur(s) :
Eschimese, Damien [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Physique - IEMN [PHYSIQUE - IEMN]
Vaurette, Francois [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Centrale de Micro Nano Fabrication - IEMN [CMNF - IEMN]
Troadec, david [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Centrale de Micro Nano Fabrication - IEMN [CMNF - IEMN]
Leveque, Gaetan [Auteur]
Ecole Polytechnique Fédérale de Lausanne [EPFL]
Melin, Thierry [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Physique - IEMN [PHYSIQUE - IEMN]
Arscott, Steve [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Nano and Microsystems - IEMN [NAM6 - IEMN]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Physique - IEMN [PHYSIQUE - IEMN]
Vaurette, Francois [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Centrale de Micro Nano Fabrication - IEMN [CMNF - IEMN]
Troadec, david [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Centrale de Micro Nano Fabrication - IEMN [CMNF - IEMN]
Leveque, Gaetan [Auteur]
Ecole Polytechnique Fédérale de Lausanne [EPFL]
Melin, Thierry [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Physique - IEMN [PHYSIQUE - IEMN]
Arscott, Steve [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Nano and Microsystems - IEMN [NAM6 - IEMN]
Titre de la revue :
SCIENTIFIC REPORTS
Éditeur :
Nature Publishing Group
Date de publication :
2019-12
ISSN :
2045-2322
Discipline(s) HAL :
Sciences de l'ingénieur [physics]
Résumé en anglais : [en]
A b s t r a c t :Here, we demonstrate a simple top-down method for nanotechnology whereby electron beam (ebeam) lithography can be combined with tilted, rotated thermal evaporation to control the topography and size of an ...
Lire la suite >A b s t r a c t :Here, we demonstrate a simple top-down method for nanotechnology whereby electron beam (ebeam) lithography can be combined with tilted, rotated thermal evaporation to control the topography and size of an assortment of metallic objects at the nanometre scale. In order to do this, the evaporation tilt angle is varied between 1 and 24°. The technique allows the 3-dimensional tailoring of a range of metallic object shapes from sharp, flat bottomed spikes to hollow cylinders and rings—all of which have rotational symmetry and whose critical dimensions are much smaller than the lithographic feature size. The lithographic feature size is varied from 400 nm down to 40 nm. The nanostructures are characterized using electron microscopy techniques—the specific shape can be predicted using topographic modelling of the deposition. Although individual nanostructures are studied here, the idea can easily be extended to fabricate arrays for e.g. photonics and metamaterials. Being a generic technique—depending on easily controlled lithographic and evaporation parameters—it can be readily incorporated into any standard planar process and could be adapted to suit other thin-film materials deposited using physical means.Lire moins >
Lire la suite >A b s t r a c t :Here, we demonstrate a simple top-down method for nanotechnology whereby electron beam (ebeam) lithography can be combined with tilted, rotated thermal evaporation to control the topography and size of an assortment of metallic objects at the nanometre scale. In order to do this, the evaporation tilt angle is varied between 1 and 24°. The technique allows the 3-dimensional tailoring of a range of metallic object shapes from sharp, flat bottomed spikes to hollow cylinders and rings—all of which have rotational symmetry and whose critical dimensions are much smaller than the lithographic feature size. The lithographic feature size is varied from 400 nm down to 40 nm. The nanostructures are characterized using electron microscopy techniques—the specific shape can be predicted using topographic modelling of the deposition. Although individual nanostructures are studied here, the idea can easily be extended to fabricate arrays for e.g. photonics and metamaterials. Being a generic technique—depending on easily controlled lithographic and evaporation parameters—it can be readily incorporated into any standard planar process and could be adapted to suit other thin-film materials deposited using physical means.Lire moins >
Langue :
Anglais
Vulgarisation :
Non
Source :
Fichiers
- https://hal.archives-ouvertes.fr/hal-02345317/document
- Accès libre
- Accéder au document
- https://www.nature.com/articles/s41598-019-44074-w.pdf
- Accès libre
- Accéder au document
- https://hal.archives-ouvertes.fr/hal-02345317/document
- Accès libre
- Accéder au document
- https://hal.archives-ouvertes.fr/hal-02345317/document
- Accès libre
- Accéder au document
- document
- Accès libre
- Accéder au document
- Sci_Rep_Nature_2019.pdf
- Accès libre
- Accéder au document
- s41598-019-44074-w.pdf
- Accès libre
- Accéder au document