[Invited] Material processing by atmospheric ...
Document type :
Autre communication scientifique (congrès sans actes - poster - séminaire...): Communication dans un congrès avec actes: Conférence invitée
Title :
[Invited] Material processing by atmospheric pressure plasma jets
Author(s) :
Pouvesle, Jean-Michel [Orateur]
Groupe de recherches sur l'énergétique des milieux ionisés [GREMI]
Valinataj-Omran, Azadeh [Auteur]
Groupe de recherches sur l'énergétique des milieux ionisés [GREMI]
Vivien, Celine [Auteur]
Bio-Micro-Electro-Mechanical Systems - IEMN [BIOMEMS - IEMN]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Dozias, Sébastien [Auteur]
Groupe de recherches sur l'énergétique des milieux ionisés [GREMI]
Eric, Robert [Auteur]
Groupe de recherches sur l'énergétique des milieux ionisés [GREMI]
Groupe de recherches sur l'énergétique des milieux ionisés [GREMI]
Valinataj-Omran, Azadeh [Auteur]
Groupe de recherches sur l'énergétique des milieux ionisés [GREMI]
Vivien, Celine [Auteur]

Bio-Micro-Electro-Mechanical Systems - IEMN [BIOMEMS - IEMN]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Dozias, Sébastien [Auteur]
Groupe de recherches sur l'énergétique des milieux ionisés [GREMI]
Eric, Robert [Auteur]
Groupe de recherches sur l'énergétique des milieux ionisés [GREMI]
Conference title :
Workshop in memory of R. d'Agostino
Conference organizers(s) :
Nagoya Institue of Technology
City :
Nagoya
Country :
Japon
Start date of the conference :
2019-03-21
English keyword(s) :
PECVD process
Atmospheric pressure plasma
plasma jet
Atmospheric pressure plasma
plasma jet
HAL domain(s) :
Physique [physics]
Sciences de l'ingénieur [physics]
Sciences de l'ingénieur [physics]
English abstract : [en]
Plasma Enhanced Chemical Vapour Deposition (PECVD) processes have been used for decades for surface processing in a wide range of industrial applications like semiconductor films, low-k films, barrier diffusion. Thin film ...
Show more >Plasma Enhanced Chemical Vapour Deposition (PECVD) processes have been used for decades for surface processing in a wide range of industrial applications like semiconductor films, low-k films, barrier diffusion. Thin film deposition is especially of high interest for biomedical applications for the production of protective coatings, adhesion layers, hydrophilic or hydrophobic layers. Up to now, beside DBD type treatment of textiles or food-dedicated films, most of used processes are usually realized at low pressure, as so many time beautifully reported by Riccardo D’Agostino and co-workers. Actually, there is a great and increasing interest in the development of plasma sources operating at atmospheric pressure. In this talk, we will present results related with plasma polymerization, plasma deposition and plasma surface modification realized with an atmospheric pressure plasma jet (APPJ), the Plasma Gun developed at GREMI.Show less >
Show more >Plasma Enhanced Chemical Vapour Deposition (PECVD) processes have been used for decades for surface processing in a wide range of industrial applications like semiconductor films, low-k films, barrier diffusion. Thin film deposition is especially of high interest for biomedical applications for the production of protective coatings, adhesion layers, hydrophilic or hydrophobic layers. Up to now, beside DBD type treatment of textiles or food-dedicated films, most of used processes are usually realized at low pressure, as so many time beautifully reported by Riccardo D’Agostino and co-workers. Actually, there is a great and increasing interest in the development of plasma sources operating at atmospheric pressure. In this talk, we will present results related with plasma polymerization, plasma deposition and plasma surface modification realized with an atmospheric pressure plasma jet (APPJ), the Plasma Gun developed at GREMI.Show less >
Language :
Anglais
Peer reviewed article :
Oui
Audience :
Internationale
Popular science :
Non
Source :
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