Title :

Native-oxide limited cross-plane thermal transport in suspended silicon membranes revealed by scanning thermal microscopy

Author(s) :

Massoud, A. [Auteur]
Bluet, J.-M. [Auteur]
INL - Spectroscopies et Nanomatériaux [INL - S&N]
Lacatena, V. [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Haras, M. [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Robillard, J.F. [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Chapuis, Pierre-Olivier [Auteur]
Centre d'Energétique et de Thermique de Lyon [CETHIL]

Journal title :

Applied Physics Letters

Pages :

063106

Publisher :

American Institute of Physics

Publication date :

2017-08-07

ISSN :

0003-6951

English keyword(s) :

Thermal conductivity
Oxides
Temperature metrology
Thermodynamic states and processes
Thin films
Contact impedance
Chemical elements
Thermal transport
Scanning thermal microscopy
Nanoparticles

HAL domain(s) :

Sciences de l'ingénieur [physics]/Mécanique [physics.med-ph]/Thermique [physics.class-ph]

English abstract : [en]

By thermally characterizing nanometer-thin suspended silicon membranes with various micrometric lengths in ambient conditions, we determine simultaneously the spatial resolution of our Wollaston-probe scanning thermal ...
Show more >By thermally characterizing nanometer-thin suspended silicon membranes with various micrometric lengths in ambient conditions, we determine simultaneously the spatial resolution of our Wollaston-probe scanning thermal microscopy experiment, which probes an area of (285 nm)², and the effective thermal conductivity of the membranes of 40 W.m^-1.K^-1. This value is smaller thanthe in-plane thermal conductivity measured using other techniques in vacuum (60 W.m^-1.K^-1), revealing that both cross-plane and in-plane heat conduction are strongly affected by the native oxide in ambient conditions. This work also underlines that high-thermal conductivity samples can be characterized by scanning thermal microscopy when micro-patterned.Show less >

Language :

Anglais

Peer reviewed article :

Oui

Audience :

Internationale

Popular science :

Non

Collections :

• Institut d'Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520

Source :

Harvested from HAL