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HOT-CARRIER RELIABILITY IN n-MOSFETs USED ...
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Document type :
Article dans une revue scientifique
DOI :
10.1016/S0026-2714(97)00217-5
Title :
HOT-CARRIER RELIABILITY IN n-MOSFETs USED AS PASS-TRANSISTORS
Author(s) :
Goguenheim, D [Auteur]
Institut des Matériaux, de Microélectronique et des Nanosciences de Provence [IM2NP]
Bravaix, Alain [Auteur]
Institut des Matériaux, de Microélectronique et des Nanosciences de Provence [IM2NP]
Vuillaume, Dominique [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Varrot, M [Auteur]
STMicroelectronics [Crolles] [ST-CROLLES]
Revil, N [Auteur]
STMicroelectronics [Crolles] [ST-CROLLES]
Mortini, P [Auteur]
STMicroelectronics [Crolles] [ST-CROLLES]
Journal title :
Microelectronics Reliability
Pages :
539-544
Publisher :
Elsevier
Publication date :
1998-04
ISSN :
0026-2714
English keyword(s) :
AC Stressing
Hot-Carriers
Pass Transistor
Propagation time
Inverter delay
HAL domain(s) :
Sciences de l'ingénieur [physics]
English abstract : [en]
AC stressing is investigated to determine the hot-carrier reliability in a 0.5 μm CMOS technology and is interpreted by a quasi-static model based on distinct damage mechanisms. The hot-carrier dependence of n-MOSFETs ...
Show more >
AC stressing is investigated to determine the hot-carrier reliability in a 0.5 μm CMOS technology and is interpreted by a quasi-static model based on distinct damage mechanisms. The hot-carrier dependence of n-MOSFETs operating in pass-transistor configurations is carefully studied as a function of the propagation time and geometry. It is shown that device degradation may exhibit in some cases a strong dependence on the propagation time and clearly differs from the simple case of inverter operation.Show less >
Language :
Anglais
Peer reviewed article :
Oui
Audience :
Internationale
Popular science :
Non
Collections :
  • Institut d'Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520
Source :
Harvested from HAL
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