Fabrication of thin-film silicon membranes ...
Document type :
Compte-rendu et recension critique d'ouvrage
DOI :
Title :
Fabrication of thin-film silicon membranes with phononic crystals for thermal conductivity measurements
Author(s) :
Haras, Maciej [Auteur correspondant]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Lacatena, Valeria [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Bah, Thierno-Moussa [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Didenko, Stanislav [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Robillard, Jean-François [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Microélectronique Silicium - IEMN [MICROELEC SI - IEMN]
Monfray, Stephane [Auteur]
Skotnicki, Thomas [Auteur]
DUBOIS, Emmanuel [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Microélectronique Silicium - IEMN [MICROELEC SI - IEMN]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Lacatena, Valeria [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Bah, Thierno-Moussa [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Didenko, Stanislav [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Robillard, Jean-François [Auteur]
![refId](/themes/Mirage2//images/idref.png)
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Microélectronique Silicium - IEMN [MICROELEC SI - IEMN]
Monfray, Stephane [Auteur]
Skotnicki, Thomas [Auteur]
DUBOIS, Emmanuel [Auteur]
![refId](/themes/Mirage2//images/idref.png)
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Microélectronique Silicium - IEMN [MICROELEC SI - IEMN]
Journal title :
IEEE Electron Device Letters
Pages :
1358-1361
Publisher :
Institute of Electrical and Electronics Engineers
Publication date :
2016-10
ISSN :
0741-3106
English keyword(s) :
Thermoelectricity
silicon
phonons
thin film devices
semiconductor materials measurements
fabrication
silicon
phonons
thin film devices
semiconductor materials measurements
fabrication
HAL domain(s) :
Sciences de l'ingénieur [physics]
English abstract : [en]
Thermoelectricity struggles with the lack of cheap, abundant, and environmentally friendly materials. Silicon could overcome this deficiency by proposing high harvested power density, simplicity, availability, harmlessness, ...
Show more >Thermoelectricity struggles with the lack of cheap, abundant, and environmentally friendly materials. Silicon could overcome this deficiency by proposing high harvested power density, simplicity, availability, harmlessness, CMOS compatibility, and cost reduction. However, despite its high Seebeck coefficient and electrical conductivity, silicon is an inefficient thermoelectric material due to a high thermal conductivity (kappa). Modern nanofabrication techniques enable reduction of kappa in silicon through attenuation of thermal phonons. In this letter, the design and the fabrication of nanostructured material onto kappa measurement platforms are presented. The proposed fabrication process is versatile and ensures compatibility with CMOS technologies. The proposed devices enable precise. measurement owing to a careful management of thermal losses. Characterization resulted in a two-fold (kappa = 59 +/- 10 W/m/K) reduction below bulk value for a 54-nm-thick plain silicon membranes. Further reduction is measured at kappa = 34.5 +/- 7.5 W/m/K for membranes with phononic crystals.Show less >
Show more >Thermoelectricity struggles with the lack of cheap, abundant, and environmentally friendly materials. Silicon could overcome this deficiency by proposing high harvested power density, simplicity, availability, harmlessness, CMOS compatibility, and cost reduction. However, despite its high Seebeck coefficient and electrical conductivity, silicon is an inefficient thermoelectric material due to a high thermal conductivity (kappa). Modern nanofabrication techniques enable reduction of kappa in silicon through attenuation of thermal phonons. In this letter, the design and the fabrication of nanostructured material onto kappa measurement platforms are presented. The proposed fabrication process is versatile and ensures compatibility with CMOS technologies. The proposed devices enable precise. measurement owing to a careful management of thermal losses. Characterization resulted in a two-fold (kappa = 59 +/- 10 W/m/K) reduction below bulk value for a 54-nm-thick plain silicon membranes. Further reduction is measured at kappa = 34.5 +/- 7.5 W/m/K for membranes with phononic crystals.Show less >
Language :
Anglais
Popular science :
Non
European Project :
Source :
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