100 nm period grating by high-index ...
Document type :
Compte-rendu et recension critique d'ouvrage
DOI :
Title :
100 nm period grating by high-index phase-mask immersion lithography
Author(s) :
Bourgin, Yannick [Auteur]
Laboratoire Hubert Curien [LHC]
Jourlin, Yves [Auteur]
Laboratoire Hubert Curien [LHC]
Parriaux, Olivier [Auteur]
Laboratoire Hubert Curien [LHC]
Talneau, Anne [Auteur]
Laboratoire de photonique et de nanostructures [LPN]
Tonchev, Svetlen [Auteur]
Laboratoire Hubert Curien [LHC]
Institut of the Solid State Physics [ISSP]
Veillas, Colette [Auteur]
Laboratoire Hubert Curien [LHC]
Karvinen, P. [Auteur]
Passilly, Nicolas [Auteur]
Franche-Comté Électronique Mécanique, Thermique et Optique - Sciences et Technologies (UMR 6174) [FEMTO-ST]
Md Zain, Ahmad [Auteur]
de La Rue, R.M. [Auteur]
van Erps, Jurgen [Auteur]
Department of Applied Physics and Photonics [Brussels] [TONA]
Troadec, David [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Laboratoire Hubert Curien [LHC]
Jourlin, Yves [Auteur]
Laboratoire Hubert Curien [LHC]
Parriaux, Olivier [Auteur]
Laboratoire Hubert Curien [LHC]
Talneau, Anne [Auteur]
Laboratoire de photonique et de nanostructures [LPN]
Tonchev, Svetlen [Auteur]
Laboratoire Hubert Curien [LHC]
Institut of the Solid State Physics [ISSP]
Veillas, Colette [Auteur]
Laboratoire Hubert Curien [LHC]
Karvinen, P. [Auteur]
Passilly, Nicolas [Auteur]
Franche-Comté Électronique Mécanique, Thermique et Optique - Sciences et Technologies (UMR 6174) [FEMTO-ST]
Md Zain, Ahmad [Auteur]
de La Rue, R.M. [Auteur]
van Erps, Jurgen [Auteur]
Department of Applied Physics and Photonics [Brussels] [TONA]
Troadec, David [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Journal title :
Optics Express
Pages :
10557-10566
Publisher :
Optical Society of America - OSA Publishing
Publication date :
2010-05-06
ISSN :
1094-4087
English keyword(s) :
Nanostructure fabrication
Diffraction gratings
Subwavelength structures
Lithography
Nanostructure fabrication.
Diffraction gratings
Subwavelength structures
Lithography
Nanostructure fabrication.
HAL domain(s) :
Sciences de l'ingénieur [physics]/Optique / photonique
English abstract : [en]
The interferogram of a high index phase mask of 200 nm period under normal incidence of a collimated beam at 244 nm wavelength with substantially suppressed zeroth order produces a 100 nm period grating in a resist film ...
Show more >The interferogram of a high index phase mask of 200 nm period under normal incidence of a collimated beam at 244 nm wavelength with substantially suppressed zeroth order produces a 100 nm period grating in a resist film under immersion. The paper describes the phase mask design, its fabrication, the effect of electron-beam lithographic stitching errors and optical assessment of the fabricated sub-cutoff grating.Show less >
Show more >The interferogram of a high index phase mask of 200 nm period under normal incidence of a collimated beam at 244 nm wavelength with substantially suppressed zeroth order produces a 100 nm period grating in a resist film under immersion. The paper describes the phase mask design, its fabrication, the effect of electron-beam lithographic stitching errors and optical assessment of the fabricated sub-cutoff grating.Show less >
Language :
Anglais
Popular science :
Non
European Project :
Source :
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