Impact of GSG probe to pads contact ...
Document type :
Communication dans un congrès avec actes
Title :
Impact of GSG probe to pads contact repeatability for on-wafer RF measurements
Author(s) :
Mokhtari, Cerine [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Sebbache, Mohamed [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Avramovic, Vanessa [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Plateforme de Caractérisation Multi-Physiques - IEMN [PCMP - IEMN]
Boyaval, Christophe [Auteur]
Centrale de Micro Nano Fabrication - IEMN [CMNF - IEMN]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Dambrine, Gilles [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Haddadi, Kamel [Auteur]
Circuits Systèmes Applications des Micro-ondes - IEMN [CSAM - IEMN ]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Sebbache, Mohamed [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Avramovic, Vanessa [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Plateforme de Caractérisation Multi-Physiques - IEMN [PCMP - IEMN]
Boyaval, Christophe [Auteur]
Centrale de Micro Nano Fabrication - IEMN [CMNF - IEMN]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Dambrine, Gilles [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Haddadi, Kamel [Auteur]
Circuits Systèmes Applications des Micro-ondes - IEMN [CSAM - IEMN ]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Conference title :
IEEE 7th International Conference on Smart Instrumentation, Measurement and Applications (ICSIMA 2021), Session 4A: Medical Instrumentation
City :
Bandung
Country :
Indonésie
Start date of the conference :
2021-08-23
Publisher :
IEEE
English keyword(s) :
On-wafer measurements
ground-signal-ground (GSG) probes
line-reflect-reflect-match (LRRM) calibration
two-port calibration
vector network analyzer (VNA)
ground-signal-ground (GSG) probes
line-reflect-reflect-match (LRRM) calibration
two-port calibration
vector network analyzer (VNA)
HAL domain(s) :
Sciences de l'ingénieur [physics]
English abstract : [en]
Improving the contact repeatability for on-wafer measurements is required to address accurate characterization of microwave and millimeter-wave extreme impedance devices foreseen in future RF semi-conductor industry. In ...
Show more >Improving the contact repeatability for on-wafer measurements is required to address accurate characterization of microwave and millimeter-wave extreme impedance devices foreseen in future RF semi-conductor industry. In this effort, residual error terms introduced by conventional on-wafer probe measurements are quantified in the frequency range 50 MHz – 67 GHz. In particular, two sets of measurements considering movements of the probes in the Z-direction only and in X-Y-Z directions are considered. Controlling the probe in the XY axis showed better results in terms of repeatability, more than 10 times à 10 GHz and more than 5 times à 60 GHz. The residual error terms are propagated to determine the measurement uncertainty on the complex impedance of capacitances theoretically tested. Capacitance value of 1 fF measured at 10 GHz was measured with an error around 80 %. Moving the probe on the Z-direction only demonstrated that, if the X and Y movements of the probe are theoretically controlled, the error could be reduced to ∼7%. In addition, preliminary design and fabrication of a new compact on-wafer probe station built up with nanorobotics is proposed. Both chuck and RF probes are equipped with nano-positioning stages operating in close loop operation.Show less >
Show more >Improving the contact repeatability for on-wafer measurements is required to address accurate characterization of microwave and millimeter-wave extreme impedance devices foreseen in future RF semi-conductor industry. In this effort, residual error terms introduced by conventional on-wafer probe measurements are quantified in the frequency range 50 MHz – 67 GHz. In particular, two sets of measurements considering movements of the probes in the Z-direction only and in X-Y-Z directions are considered. Controlling the probe in the XY axis showed better results in terms of repeatability, more than 10 times à 10 GHz and more than 5 times à 60 GHz. The residual error terms are propagated to determine the measurement uncertainty on the complex impedance of capacitances theoretically tested. Capacitance value of 1 fF measured at 10 GHz was measured with an error around 80 %. Moving the probe on the Z-direction only demonstrated that, if the X and Y movements of the probe are theoretically controlled, the error could be reduced to ∼7%. In addition, preliminary design and fabrication of a new compact on-wafer probe station built up with nanorobotics is proposed. Both chuck and RF probes are equipped with nano-positioning stages operating in close loop operation.Show less >
Language :
Anglais
Peer reviewed article :
Oui
Audience :
Internationale
Popular science :
Non
Comment :
ORAL Session 4A: Medical Instrumentation
Source :
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