Titre :

Electromechanical sensitivity of ZnO thin films at high-pressure regime for SAW strain sensor applications

Auteur(s) :

Arab, Fahima [Auteur]
Université Ferhat-Abbas Sétif 1 [Sétif] [UFAS1]
Kanouni, Fares [Auteur]
Université Ferhat-Abbas Sétif 1 [Sétif] [UFAS1]
Serhane, Rafik [Auteur]
Centre de Développement des Technologies Avancées [CDTA]
Pennec, Yan [Auteur]
Physique - IEMN [PHYSIQUE - IEMN]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]

Titre de la revue :

Materials Today Communications

Pagination :

107719

Éditeur :

Elsevier

Date de publication :

2024-03

ISSN :

2352-4928

Discipline(s) HAL :

Physique [physics]
Sciences de l'ingénieur [physics]

Résumé en anglais : [en]

This paper employs Density Functional Theory (DFT) to investigate the influence of high hydrostatic pressure on the piezo-elastic properties of ZnO with a specific focus on its repercussions for Surface Acoustic Wave (SAW) ...
Lire la suite >This paper employs Density Functional Theory (DFT) to investigate the influence of high hydrostatic pressure on the piezo-elastic properties of ZnO with a specific focus on its repercussions for Surface Acoustic Wave (SAW) devices. Our findings reveal a significant enhancement in the piezoelectric coefficient d33 under high-pressure conditions, particularly reaching 13.09 pC/N at 8 GPa compared to the unpressurized state. This noteworthy improvement directly contributes to an overall enhancement in the electromechanical coupling coefficients (K2), emphasizing for the first time the potential of high-pressure conditions to positively influence the performance of ZnO/Al2O3 SAW devices. To confirm that, we utilized the Finite Element Method (FEM) to analyze the performance of a Surface Acoustic Wave (SAW) device based on ZnO for both propagating modes, namely Rayleigh and Sezawa, under elevated pressure conditions. We observed an improvement in the electromechanical coupling factor (K2) for the Rayleigh and the Sezawa modes, with enhancements of approximately 23% and 52%, respectively, under an applied pressure of 8 GPa compared to 0 GPa. Furthermore, we found that the Sezawa mode exhibits eight times greater sensitivity to pressure variations compared to the Rayleigh mode. These findings provide designers with a better understanding of the electromechanical responsivity and sensitivity of the ZnO-SAW devices to high level of applied pressure.Lire moins >

Langue :

Anglais

Vulgarisation :

Non

Collections :

• Institut d'Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520

Source :

Harvested from HAL