Influence of Ga doping on the microstructure ...
Type de document :
Article dans une revue scientifique
DOI :
URL permanente :
Titre :
Influence of Ga doping on the microstructure of 3C-SiC layers grown on 4H-SiC substrates by VLS mechanism
Auteur(s) :
Marinova, Maya [Auteur]
Department of Physics [Thessaloniki]
Mantzari, Alkyoni [Auteur]
Department of Physics [Thessaloniki]
Andreadou, Ariadne [Auteur]
Department of Physics [Thessaloniki]
Lorenzzi, Jean [Auteur]
Laboratoire des Multimatériaux et Interfaces [LMI]
Ferro, Gabriel [Auteur]
Laboratoire des Multimatériaux et Interfaces [LMI]
Polychroniadis, Efstathios K. [Auteur]
Department of Physics [Thessaloniki]
Department of Physics [Thessaloniki]
Mantzari, Alkyoni [Auteur]
Department of Physics [Thessaloniki]
Andreadou, Ariadne [Auteur]
Department of Physics [Thessaloniki]
Lorenzzi, Jean [Auteur]
Laboratoire des Multimatériaux et Interfaces [LMI]
Ferro, Gabriel [Auteur]
Laboratoire des Multimatériaux et Interfaces [LMI]
Polychroniadis, Efstathios K. [Auteur]
Department of Physics [Thessaloniki]
Titre de la revue :
Physica Status Solidi (c)
Numéro :
10
Pagination :
72-75
Date de publication :
2013
Discipline(s) HAL :
Chimie/Matériaux
Résumé en anglais : [en]
This work focuses on the Transmission Electron Microscopy investigation of p‐type doped 3C‐SiC layers grown by Vapor‐Liquid‐Solid mechanism using Si‐Ga melts on 4H‐SiC substrates. Ga concentration strongly influences the ...
Lire la suite >This work focuses on the Transmission Electron Microscopy investigation of p‐type doped 3C‐SiC layers grown by Vapor‐Liquid‐Solid mechanism using Si‐Ga melts on 4H‐SiC substrates. Ga concentration strongly influences the appearance of defects in the grown layers. Ga inclusions are observed only in the layer grown at the highest temperature and lowest Ga content in the melt. At the highest concentration of Ga in the melt main defects are dislocations forming periodic bands along 〈equation image〉 and 〈equation image〉 directions. The most appropriate conditions (in terms of defect density) for VLS growth using SiGa melts, as defined from the current study, should be growth in Si25Ga75 alloy at T = 1200 ºC.Lire moins >
Lire la suite >This work focuses on the Transmission Electron Microscopy investigation of p‐type doped 3C‐SiC layers grown by Vapor‐Liquid‐Solid mechanism using Si‐Ga melts on 4H‐SiC substrates. Ga concentration strongly influences the appearance of defects in the grown layers. Ga inclusions are observed only in the layer grown at the highest temperature and lowest Ga content in the melt. At the highest concentration of Ga in the melt main defects are dislocations forming periodic bands along 〈equation image〉 and 〈equation image〉 directions. The most appropriate conditions (in terms of defect density) for VLS growth using SiGa melts, as defined from the current study, should be growth in Si25Ga75 alloy at T = 1200 ºC.Lire moins >
Langue :
Anglais
Comité de lecture :
Oui
Audience :
Internationale
Vulgarisation :
Non
Projet Européen :
Collections :
Date de dépôt :
2019-06-17T08:43:24Z
2020-03-17T16:35:39Z
2020-03-17T16:35:39Z