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GaN-on-silicon transistors with reduced ...
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Document type :
Article dans une revue scientifique
DOI :
10.35848/1882-0786/abdca0
Title :
GaN-on-silicon transistors with reduced current collapse and improved blocking voltage by means of local substrate removal
Author(s) :
Abid, Idriss [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Canato, Eleonora [Auteur]
Università degli Studi di Padova = University of Padua [Unipd]
Meneghini, Matteo [Auteur]
Università degli Studi di Padova = University of Padua [Unipd]
Meneghesso, Gaudenzio [Auteur]
Università degli Studi di Padova = University of Padua [Unipd]
Cheng, Kai [Auteur]
Medjdoub, Farid [Auteur] refId
WIde baNd gap materials and Devices - IEMN [WIND - IEMN]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Journal title :
Applied Physics Express
Pages :
036501
Publisher :
IOPScience - Japan Society of Applied Physics
Publication date :
2021-02
ISSN :
1882-0786
HAL domain(s) :
Sciences de l'ingénieur [physics]
English abstract : [en]
We report on the demonstration of low trapping effects above 1200 V of GaN-on-silicon transistors using a local substrate removal (LSR) followed by a thick backside ultra-wide-bandgap AlN deposition. Substrate ramp ...
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We report on the demonstration of low trapping effects above 1200 V of GaN-on-silicon transistors using a local substrate removal (LSR) followed by a thick backside ultra-wide-bandgap AlN deposition. Substrate ramp measurements show reduced hysteresis up to 3000 V. It has been found that the LSR approach not only enable to extend the operation voltage capabilities of GaN-on-Silicon HEMTs with low on-resistance but also allow to reduce trapping effects directly affecting their dynamic behavior. This work points out that a large part of the electron trapping under high bias occurs at the AlN nucleation layer and Si substrate interface.Show less >
Language :
Anglais
Peer reviewed article :
Oui
Audience :
Internationale
Popular science :
Non
ANR Project :
Matériaux à ultra large bande interdite pour les futurs applications d'électronique de puissance
Collections :
  • Institut d'Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520
Source :
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