Title :

Hydrogen Silsesquioxane-Based Nanofluidics

Author(s) :

Punniyakoti, Sathyanarayanan [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Sivakumarasamy, Ragavendran [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Vaurette, Francois [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Joseph, Pierre [Auteur]
Équipe Micro-Nanofluidique pour les sciences de la vie et de l’environnement [LAAS-MILE]
Nishiguchi, Katsuhiko [Auteur]
NTT Basic Research Laboratories [Tokio]
Fujiwara, Akira [Auteur]
NTT Basic Research Laboratories [Tokio]
Clément, Nicolas [Auteur]
NTT Basic Research Laboratories [Tokio]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]

Journal title :

Advanced Materials Interfaces

Pages :

1601155

Publisher :

Wiley

Publication date :

2017-04

ISSN :

2196-7350

English keyword(s) :

Nanofluidics
HSQ
3D Nanofluidics
extremely slow evaporation rate

HAL domain(s) :

Physique [physics]/Physique [physics]/Dynamique des Fluides [physics.flu-dyn]
Sciences de l'ingénieur [physics]/Micro et nanotechnologies/Microélectronique

English abstract : [en]

Nanofluidics show great promise for the control of small volumes and single molecules, especially for biological and energy applications. To build up more and more complex nanofluidics systems, a versatile and reproducible ...
Show more >Nanofluidics show great promise for the control of small volumes and single molecules, especially for biological and energy applications. To build up more and more complex nanofluidics systems, a versatile and reproducible fabrication technique with nanometer precision alignment is desirable. In this article, two e-beam lithography methods to fabricate nanofluidic channels based on hydrogen silsesquioxane, a high-resolution negative-tone inorganic resist, are presented. The robustness and versatility of the fabrication processes are demonstrated on silicon, glass, and flexible substrates. The high precision ability is illustrated with nanometric alignment of nanofluidic channels on gold nanoparticles and nanotransistor sensors, as well as for 3D nanofluidics prototyping. Furthermore, an unexpected extremely slow water evaporation rate (≈1 week for 300 μm long nanochannels) is noticed. This feature enables a simple and reliable manipulation of nanofluidic chips for various studies.Show less >

Language :

Anglais

Peer reviewed article :

Oui

Audience :

Internationale

Popular science :

Non

Collections :

• Institut d'Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520

Source :

Harvested from HAL