Very low effective electromagnetic parameters ...
Document type :
Communication dans un congrès avec actes
Title :
Very low effective electromagnetic parameters lenses for the unlicensed 60 GHz band
Author(s) :
Navarro-Cia, Miguel [Auteur]
Universidad Pública de Navarra [Espagne] = Public University of Navarra [UPNA]
Beruete, Miguel [Auteur]
Universidad Pública de Navarra [Espagne] = Public University of Navarra [UPNA]
Sorolla, Mario [Auteur]
Universidad Pública de Navarra [Espagne] = Public University of Navarra [UPNA]
Akalin, Tahsin [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Engheta, Nader [Auteur]
Universidad Pública de Navarra [Espagne] = Public University of Navarra [UPNA]
Beruete, Miguel [Auteur]
Universidad Pública de Navarra [Espagne] = Public University of Navarra [UPNA]
Sorolla, Mario [Auteur]
Universidad Pública de Navarra [Espagne] = Public University of Navarra [UPNA]
Akalin, Tahsin [Auteur]

Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Engheta, Nader [Auteur]
Conference title :
36th International Conference on Infrared, Millimeter and THz Waves, IRMMW-THz 2011
City :
Houston, TX
Country :
Etats-Unis d'Amérique
Start date of the conference :
2011-10-02
Book title :
Proceedings of the 36th International Conference on Infrared, Millimeter and THz Waves, IRMMW-THz 2011
Publication date :
2011
English keyword(s) :
Lenses
Metamaterials
Arrays
Magnetic materials
Electromagnetics
Optical ring resonators
Metamaterials
Arrays
Magnetic materials
Electromagnetics
Optical ring resonators
HAL domain(s) :
Sciences de l'ingénieur [physics]
English abstract : [en]
In this presentation advances on metallic lenses based on extreme electromagnetic parameters will be shown: either epsilon near zero or epsilon and mu near zero simultaneously. The former is generated by an array of ...
Show more >In this presentation advances on metallic lenses based on extreme electromagnetic parameters will be shown: either epsilon near zero or epsilon and mu near zero simultaneously. The former is generated by an array of continuous waveguides at cutoff, whereas the latter is composed of stacked subwavelength hole arrays that can be understood as discontinuous waveguides operating below cutoff.Show less >
Show more >In this presentation advances on metallic lenses based on extreme electromagnetic parameters will be shown: either epsilon near zero or epsilon and mu near zero simultaneously. The former is generated by an array of continuous waveguides at cutoff, whereas the latter is composed of stacked subwavelength hole arrays that can be understood as discontinuous waveguides operating below cutoff.Show less >
Language :
Anglais
Peer reviewed article :
Oui
Audience :
Internationale
Popular science :
Non
Source :