Preparation and multi-characterization of ...
Document type :
Article dans une revue scientifique
DOI :
Title :
Preparation and multi-characterization of plasma polymerized allylamine films
Author(s) :
Abbas, Abdennour [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Vivien, Céline [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Bocquet, Bertrand [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Guillochon, Didier [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Supiot, Philippe [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Vivien, Céline [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Bocquet, Bertrand [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Guillochon, Didier [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Supiot, Philippe [Auteur]

Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Journal title :
Plasma Processes and Polymers
Pages :
593-604
Publisher :
Wiley-VCH Verlag
Publication date :
2009
ISSN :
1612-8850
HAL domain(s) :
Sciences de l'ingénieur [physics]
English abstract : [en]
Plasma polymerized allylamine (ppAA) films were deposited in a radio-frequency glow discharge plasma reactor using a continuous-wave mode and varying the discharge power from 15 to 125 W. The deposition rate reached ...
Show more >Plasma polymerized allylamine (ppAA) films were deposited in a radio-frequency glow discharge plasma reactor using a continuous-wave mode and varying the discharge power from 15 to 125 W. The deposition rate reached 26 nm · min−1 and was constant within at least half an hour of process. The chemical structure and elemental composition of the deposited films were investigated by Fourier transform infrared and X-ray photoelectron spectroscopies, whereas surface properties were analyzed by atomic force microscopy and surface free energy measurement. A special focus is given to the stability of ppAA in aqueous media and primary amine quantification. The use of fluorescent microscopy and UV-Visible spectroscopy enabled us to detect and quantify the primary amine, respectively. All the studied parameters varied widely with enhanced power with a transition point around 50 W. Over this value, the results remain relatively unchangedShow less >
Show more >Plasma polymerized allylamine (ppAA) films were deposited in a radio-frequency glow discharge plasma reactor using a continuous-wave mode and varying the discharge power from 15 to 125 W. The deposition rate reached 26 nm · min−1 and was constant within at least half an hour of process. The chemical structure and elemental composition of the deposited films were investigated by Fourier transform infrared and X-ray photoelectron spectroscopies, whereas surface properties were analyzed by atomic force microscopy and surface free energy measurement. A special focus is given to the stability of ppAA in aqueous media and primary amine quantification. The use of fluorescent microscopy and UV-Visible spectroscopy enabled us to detect and quantify the primary amine, respectively. All the studied parameters varied widely with enhanced power with a transition point around 50 W. Over this value, the results remain relatively unchangedShow less >
Language :
Anglais
Peer reviewed article :
Oui
Audience :
Non spécifiée
Popular science :
Non
Source :
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