Title :

Plasma polymer process for microfluidic devices fabrication

Author(s) :

Abbas, Abdennour [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Bocquet, Bertrand [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Bourzgui, Nour-Eddine [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Vivien, Celine [Auteur]
Laboratoire de Génie des Procédés d'Interactions Fluides Réactifs-Matériaux - EA 3571 [GéPIFRéM]
Supiot, Philippe [Auteur]

Conference title :

IEEE 36th International Conference on Plasma Science

City :

San Diego, California

Country :

Etats-Unis d'Amérique

Start date of the conference :

2009-05-31

English keyword(s) :

Microfabrication
plasma polymerization
microfluidic microsystem
plasma polymer
microchannel
thin films
PPSL
PPMS
organisilicon
TMDS
Tetramethyldisiloxane

HAL domain(s) :

Physique [physics]/Matière Condensée [cond-mat]/Science des matériaux [cond-mat.mtrl-sci]

English abstract : [en]

Plasma polymerization, so called Remote Plasma Enhanced Chemical Vapour Deposition (RPECVD) has been increasingly used in microsystems field. Plasma polymers served primarily as supports for electronic sensors or carriers ...
Show more >Plasma polymerization, so called Remote Plasma Enhanced Chemical Vapour Deposition (RPECVD) has been increasingly used in microsystems field. Plasma polymers served primarily as supports for electronic sensors or carriers for biomolecules and cell attachment. This work describes the first use of plasma thin film deposition for the easy, fast and reduced cost fabrication of microfluidic channels. A new method named “plasma polymerization on a micropatterned surface” (PPMS) is presented.Show less >

Language :

Anglais

Peer reviewed article :

Oui

Audience :

Internationale

Popular science :

Non

Collections :

• Institut d'Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520

Source :

Harvested from HAL