Preparation and characterization of thin organosilicon films deposited on SPR chip

Szunerits, Sabine; Abou Rich, Sarni; Coffinier, Yannick; Languille, Marie-Angélique; Supiot, Philippe; Boukherroub, Rabah

Document type :

Article dans une revue scientifique

DOI :

10.1016/j.electacta.2007.08.069

Title :

Preparation and characterization of thin organosilicon films deposited on SPR chip

Author(s) :

Szunerits, Sabine [Auteur]
Laboratoire d'Electrochimie et de Physico-chimie des Matériaux et des Interfaces [LEPMI ]
Abou Rich, Sarni [Auteur]
Coffinier, Yannick [Auteur]

Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
NanoBioInterfaces - IEMN [NBI - IEMN]
Languille, Marie-Angélique [Auteur]
Supiot, Philippe [Auteur]

Boukherroub, Rabah [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Institut de Recherche Interdisciplinaire [Villeneuve d'Ascq] [IRI]

Journal title :

Electrochimica Acta

Pages :

pp. 3910-3915

Publisher :

Elsevier

Publication date :

2008-04-20

ISSN :

0013-4686

HAL domain(s) :

Chimie/Matériaux

English abstract : [en]

The paper reports on the preparation and characterization of organosilicon thin polymer films deposited on glass slides coated with 5 nm adhesion layer of titanium and 50 nm of gold. The polymer was obtained by the ...
Show more >The paper reports on the preparation and characterization of organosilicon thin polymer films deposited on glass slides coated with 5 nm adhesion layer of titanium and 50 nm of gold. The polymer was obtained by the decomposition of 1,1,3,3-tetramethyldisiloxane precursor (TMDSO) premixed with oxygen induced in a N<sub>2</sub> plasma afterglow using remote plasma-enhanced chemical vapor deposition (PECVD) technique. The film thickness was controlled by laser interferometry and was 9 nm. The chemical stability of the gold substrate coated with the organosilicon polymer film (p-TMDSO) was studied in different acidic and basic solutions (pH 1–14). While the gold/polymer interface showed a high stability in acidic media, the film was almost completely removed in basic solutions. The resulting surfaces were characterized using atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), water contact angle measurements, cyclic voltammetry, and surface plasmon resonance (SPR).Show less >

Language :

Anglais

Peer reviewed article :

Oui

Audience :

Internationale

Popular science :

Non

Collections :