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Preparation and characterization of thin ...
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Document type :
Article dans une revue scientifique
DOI :
10.1016/j.electacta.2007.08.069
Title :
Preparation and characterization of thin organosilicon films deposited on SPR chip
Author(s) :
Szunerits, Sabine [Auteur]
Laboratoire d'Electrochimie et de Physico-chimie des Matériaux et des Interfaces [LEPMI ]
Abou Rich, Sarni [Auteur]
Coffinier, Yannick [Auteur] refId
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
NanoBioInterfaces - IEMN [NBI - IEMN]
Languille, Marie-Angélique [Auteur]
Supiot, Philippe [Auteur] refId
Boukherroub, Rabah [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Institut de Recherche Interdisciplinaire [Villeneuve d'Ascq] [IRI]
Journal title :
Electrochimica Acta
Pages :
pp. 3910-3915
Publisher :
Elsevier
Publication date :
2008-04-20
ISSN :
0013-4686
HAL domain(s) :
Chimie/Matériaux
English abstract : [en]
The paper reports on the preparation and characterization of organosilicon thin polymer films deposited on glass slides coated with 5 nm adhesion layer of titanium and 50 nm of gold. The polymer was obtained by the ...
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The paper reports on the preparation and characterization of organosilicon thin polymer films deposited on glass slides coated with 5 nm adhesion layer of titanium and 50 nm of gold. The polymer was obtained by the decomposition of 1,1,3,3-tetramethyldisiloxane precursor (TMDSO) premixed with oxygen induced in a N<sub>2</sub> plasma afterglow using remote plasma-enhanced chemical vapor deposition (PECVD) technique. The film thickness was controlled by laser interferometry and was 9 nm. The chemical stability of the gold substrate coated with the organosilicon polymer film (p-TMDSO) was studied in different acidic and basic solutions (pH 1–14). While the gold/polymer interface showed a high stability in acidic media, the film was almost completely removed in basic solutions. The resulting surfaces were characterized using atomic force microscopy (AFM), X-ray photoelectron spectroscopy (XPS), water contact angle measurements, cyclic voltammetry, and surface plasmon resonance (SPR).Show less >
Language :
Anglais
Peer reviewed article :
Oui
Audience :
Internationale
Popular science :
Non
Collections :
  • Institut d'Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520
Source :
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