Electrochemical investigation of gold/silica ...
Document type :
Article dans une revue scientifique
Title :
Electrochemical investigation of gold/silica thin film interfaces for electrochemical surface plasmon resonance studies
Author(s) :
Szunerits, Sabine [Auteur correspondant]
Laboratoire d'Electrochimie et de Physico-chimie des Matériaux et des Interfaces [LEPMI ]
Boukherroub, Rabah [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Institut de Recherche Interdisciplinaire [Villeneuve d'Ascq] [IRI]

Laboratoire d'Electrochimie et de Physico-chimie des Matériaux et des Interfaces [LEPMI ]
Boukherroub, Rabah [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Institut de Recherche Interdisciplinaire [Villeneuve d'Ascq] [IRI]
Journal title :
Electrochemistry Communications
Pages :
pp. 439-444
Publisher :
Elsevier
Publication date :
2006-03
ISSN :
1388-2481
English keyword(s) :
Gold electrode
Silica thin film
Coating
Cyclic voltammetry
Surface plasmon resonance
Anodic dissolution
Silica thin film
Coating
Cyclic voltammetry
Surface plasmon resonance
Anodic dissolution
HAL domain(s) :
Chimie/Matériaux
English abstract : [en]
The paper reports on the electrochemical behaviour of a thin gold film electrode coated with a 9.7 nm thick silicon dioxide (SiO<sub>x</sub>) layer. Chemical and mechanical stable SiO<sub>x</sub> layers on gold were ...
Show more >The paper reports on the electrochemical behaviour of a thin gold film electrode coated with a 9.7 nm thick silicon dioxide (SiO<sub>x</sub>) layer. Chemical and mechanical stable SiO<sub>x</sub> layers on gold were synthesised by plasma enhanced chemical vapour deposition (PECVD). The electrochemical behaviour of the thin gold film electrodes with or without SiO<sub>x</sub> coating were compared using cyclic voltammetry (CV) in potassium chloride solutions and in the presence of an electrochemical redox mediator (Fe(CN)<sub>6</sub><sup>4-</sup>) . These studies showed that homogeneous thin SiO<sub>x</sub> layers are formed on gold, protecting efficiently the gold electrode from anodic dissolution, while preserving electrochemical mass transfer at the interface. The electrochemical dissolution of the uncoated thin gold film was further evidenced by coupled surface plasmon resonance (SPR) studies.Show less >
Show more >The paper reports on the electrochemical behaviour of a thin gold film electrode coated with a 9.7 nm thick silicon dioxide (SiO<sub>x</sub>) layer. Chemical and mechanical stable SiO<sub>x</sub> layers on gold were synthesised by plasma enhanced chemical vapour deposition (PECVD). The electrochemical behaviour of the thin gold film electrodes with or without SiO<sub>x</sub> coating were compared using cyclic voltammetry (CV) in potassium chloride solutions and in the presence of an electrochemical redox mediator (Fe(CN)<sub>6</sub><sup>4-</sup>) . These studies showed that homogeneous thin SiO<sub>x</sub> layers are formed on gold, protecting efficiently the gold electrode from anodic dissolution, while preserving electrochemical mass transfer at the interface. The electrochemical dissolution of the uncoated thin gold film was further evidenced by coupled surface plasmon resonance (SPR) studies.Show less >
Language :
Anglais
Peer reviewed article :
Oui
Audience :
Internationale
Popular science :
Non
Source :
Files
- https://api.istex.fr/ark:/67375/6H6-8VRMCMB4-W/fulltext.pdf?sid=hal
- Open access
- Access the document
- https://api.istex.fr/ark:/67375/6H6-8VRMCMB4-W/fulltext.pdf?sid=hal
- Open access
- Access the document
- https://api.istex.fr/ark:/67375/6H6-8VRMCMB4-W/fulltext.pdf?sid=hal
- Open access
- Access the document
- https://api.istex.fr/ark:/67375/6H6-8VRMCMB4-W/fulltext.pdf?sid=hal
- Open access
- Access the document
- fulltext.pdf
- Open access
- Access the document