In-Plane Silicon-On-Nothing Nanometer-Scale ...
Document type :
Compte-rendu et recension critique d'ouvrage
DOI :
Title :
In-Plane Silicon-On-Nothing Nanometer-Scale Resonant Suspended Gate MOSFET for In-IC Integration Perspectives
Author(s) :
Durand, Cédric [Auteur correspondant]
Laboratoire Composants Microsystèmes [LCMS]
STMicroelectronics [Crolles] [ST-CROLLES]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Casset, Fabrice [Auteur]
Laboratoire Composants Microsystèmes [LCMS]
Renaux, Philippe [Auteur]
Laboratoire Caratérisation et Fiabilité des Microsystèmes [LCFM]
Abelé, Nicolas [Auteur]
STMicroelectronics [Crolles] [ST-CROLLES]
Legrand, Bernard [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Renaud, Denis [Auteur]
Services des Opérations Technologiques [SDOT]
Ollier, Eric [Auteur]
Laboratoire Composants Microsystèmes [LCMS]
Ancey, Pascal [Auteur]
STMicroelectronics [Crolles] [ST-CROLLES]
M. Ionescu, Adrian [Auteur]
Institut de théorie des phénomènes physiques [EPFL]
Buchaillot, Lionel [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Laboratoire Composants Microsystèmes [LCMS]
STMicroelectronics [Crolles] [ST-CROLLES]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Casset, Fabrice [Auteur]
Laboratoire Composants Microsystèmes [LCMS]
Renaux, Philippe [Auteur]
Laboratoire Caratérisation et Fiabilité des Microsystèmes [LCFM]
Abelé, Nicolas [Auteur]
STMicroelectronics [Crolles] [ST-CROLLES]
Legrand, Bernard [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Renaud, Denis [Auteur]
Services des Opérations Technologiques [SDOT]
Ollier, Eric [Auteur]
Laboratoire Composants Microsystèmes [LCMS]
Ancey, Pascal [Auteur]
STMicroelectronics [Crolles] [ST-CROLLES]
M. Ionescu, Adrian [Auteur]
Institut de théorie des phénomènes physiques [EPFL]
Buchaillot, Lionel [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Journal title :
IEEE Electron Device Letters
Pages :
494-496
Publisher :
Institute of Electrical and Electronics Engineers
Publication date :
2008-05-05
ISSN :
0741-3106
English keyword(s) :
In-IC integration
in-plane resonator
nanometerscale resonator
resonant suspended gate (RSG) MOSFET
silicon on nothing
SON
in-plane resonator
nanometerscale resonator
resonant suspended gate (RSG) MOSFET
silicon on nothing
SON
HAL domain(s) :
Sciences de l'ingénieur [physics]/Micro et nanotechnologies/Microélectronique
English abstract : [en]
A14-MHz in-plane nanoelectromechanical resonator based on a resonant-suspended-gate (RSG) MOSFET principle and integrated in a front-end process is demonstrated. The devices are in-plane flexural vibration mode beams (L = ...
Show more >A14-MHz in-plane nanoelectromechanical resonator based on a resonant-suspended-gate (RSG) MOSFET principle and integrated in a front-end process is demonstrated. The devices are in-plane flexural vibration mode beams (L = 10 μm, w = 165 nm, and h = 400 nm) with 120-nm gaps. This letter details the design and process flow fabrication steps. Then, the electrical device characteristics are demonstrated, comprising static and dynamic studies around the resonant frequency. Devices enable the comparison of a pure capacitive detection with the RSG-MOSFET-based detection on the same component, showing a 4.3-dB-huge peak. Due to its output signal amplification and in-IC integration potentialities, the RSG-MOSFET-based detection is ideal for any type of nanoelectromechanical structure displacement detection.Show less >
Show more >A14-MHz in-plane nanoelectromechanical resonator based on a resonant-suspended-gate (RSG) MOSFET principle and integrated in a front-end process is demonstrated. The devices are in-plane flexural vibration mode beams (L = 10 μm, w = 165 nm, and h = 400 nm) with 120-nm gaps. This letter details the design and process flow fabrication steps. Then, the electrical device characteristics are demonstrated, comprising static and dynamic studies around the resonant frequency. Devices enable the comparison of a pure capacitive detection with the RSG-MOSFET-based detection on the same component, showing a 4.3-dB-huge peak. Due to its output signal amplification and in-IC integration potentialities, the RSG-MOSFET-based detection is ideal for any type of nanoelectromechanical structure displacement detection.Show less >
Language :
Anglais
Popular science :
Non
Source :
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