3D self-assembling of SU-8 microstructures ...
Type de document :
Communication dans un congrès avec actes
Titre :
3D self-assembling of SU-8 microstructures on silicon by plasma induced compressive stress
Auteur(s) :
Bureau, Jean-Baptiste [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Legrand, Bernard [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Collard, Dominique [Auteur]
Buchaillot, Lionel [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Legrand, Bernard [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Collard, Dominique [Auteur]
Buchaillot, Lionel [Auteur]

Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Titre de la manifestation scientifique :
13th International Conference on Solid-State Sensors, Actuators and Microsystems, 2005. Digest of Technical Papers. TRANSDUCERS '05.
Ville :
Seoul
Pays :
Corée du Sud
Date de début de la manifestation scientifique :
2005-06-05
Titre de l’ouvrage :
Proceedings of the 13th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS'05
Éditeur :
IEEE, Piscataway, NJ, USA
Date de publication :
2005
Mot(s)-clé(s) en anglais :
Microstructure
Silicon
Compressive stress
Plasma x-ray sources
Resists
Particle beams
Plasma applications
Plasma properties
Spectroscopy
Performance analysis
Silicon
Compressive stress
Plasma x-ray sources
Resists
Particle beams
Plasma applications
Plasma properties
Spectroscopy
Performance analysis
Discipline(s) HAL :
Sciences de l'ingénieur [physics]
Résumé en anglais : [en]
This paper presents the development of suspended movable microstructures made of SU-8 photoresist where compressive stress leads to 3D self-assembled microstructures. Internal compressive stress in the photoresist is induced ...
Lire la suite >This paper presents the development of suspended movable microstructures made of SU-8 photoresist where compressive stress leads to 3D self-assembled microstructures. Internal compressive stress in the photoresist is induced by an SF/sub 6/ based plasma process. Clamped-clamped beam structures have been fabricated to characterize the stress depending on the plasma duration and the lengths of the beams. A compressive stress of 48 MPa was calculated for a 3 minute plasma. X-ray photoelectron spectroscopy (XPS) analysis has been performed to characterize the surface of the structures. These mechanical properties could be used to make 3D self-assembled structures for applications in biological sciencesLire moins >
Lire la suite >This paper presents the development of suspended movable microstructures made of SU-8 photoresist where compressive stress leads to 3D self-assembled microstructures. Internal compressive stress in the photoresist is induced by an SF/sub 6/ based plasma process. Clamped-clamped beam structures have been fabricated to characterize the stress depending on the plasma duration and the lengths of the beams. A compressive stress of 48 MPa was calculated for a 3 minute plasma. X-ray photoelectron spectroscopy (XPS) analysis has been performed to characterize the surface of the structures. These mechanical properties could be used to make 3D self-assembled structures for applications in biological sciencesLire moins >
Langue :
Anglais
Comité de lecture :
Oui
Audience :
Internationale
Vulgarisation :
Non
Source :