Title :

A First Outlook of Sputtered FeWO ₄ Thin Films for Micro-Supercapacitor Electrodes

Author(s) :

Buvat, Gaetan [Auteur]
Institut d'Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520
Iadecola, Antonella [Auteur]
Blanchard, Florent [Auteur]
Unité de Catalyse et Chimie du Solide (UCCS) - UMR 8181
Brousse, Thierry [Auteur]
Roussel, Pascal [Auteur]
Unité de Catalyse et Chimie du Solide (UCCS) - UMR 8181
Lethien, Christophe [Auteur]
Institut d'Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520

Journal title :

Journal of The Electrochemical Society

Abbreviated title :

J. Electrochem. Soc.

Volume number :

168

Pages :

030524

Publication date :

2021-03-01

ISSN :

0013-4651, 1945-7111

HAL domain(s) :

Chimie/Chimie inorganique

English abstract : [en]

The next generation of Internet of Things devices requires micro-supercapacitors operating at high voltage which is difficult to achieve using symmetrical design. Thus, their fabrication in an asymmetric configuration is ...
Show more >The next generation of Internet of Things devices requires micro-supercapacitors operating at high voltage which is difficult to achieve using symmetrical design. Thus, their fabrication in an asymmetric configuration is mandatory. While MnO 2 is well-established as positive electrode, the scarcity of existing efficient materials able to be used at the negative side drives the research towards new promising materials. Since few years, a new class of oxide materials, named multicationic oxides, were demonstrated to be attractive solutions as bulk electrodes for electrochemical capacitor. Among them, the wolframite-type FeWO 4 oxide was proposed as an interesting negative electrode material for asymmetric FeWO 4 /MnO 2 electrochemical capacitors. The present paper reports for the first time on the successful thin film synthesis of such iron-tungstate oxide films by reactive DC magnetron sputtering, a deposition method widely used in the semiconductor industry to manufacture micro-devices. The pseudocapacitive behaviour documented at the bulk scale is preserved at the thin film level as well, and opens-up the possibility to use FeWO 4 in the next generations of micro-supercapacitors.Show less >

Audience :

Non spécifiée

Popular science :

Non

Administrative institution(s) :

CNRS
Centrale Lille
ENSCL
ISEN
Institut Catholique Lille
Univ. Artois
Univ. Valenciennes
Université de Lille

Collections :

• Institut d'Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520
• Unité de Catalyse et Chimie du Solide (UCCS) - UMR 8181

Research team(s) :

Matériaux inorganiques, structures, systèmes et propriétés (MISSP)

Submission date :

2022-03-24T09:02:44Z
2022-03-24T09:49:43Z