Optimization of cold plasma process ...
Type de document :
Article dans une revue scientifique: Article original
URL permanente :
Titre :
Optimization of cold plasma process parameters for organosilicon films deposition on carbon steel: Study of the surface pretreatment effect on corrosion protection performance in 3-wt% NaCl medium
Auteur(s) :
Esbayou, M. [Auteur]
Bentiss, Fouad [Auteur]
Casetta, Mathilde [Auteur]
Unité Matériaux et Transformations - UMR 8207 [UMET]
Nyassi, Abdelhamid [Auteur]
Jama, charafeddine [Auteur]
Unité Matériaux et Transformations - UMR 8207 [UMET]
Bentiss, Fouad [Auteur]
Casetta, Mathilde [Auteur]
Unité Matériaux et Transformations - UMR 8207 [UMET]
Nyassi, Abdelhamid [Auteur]
Jama, charafeddine [Auteur]
Unité Matériaux et Transformations - UMR 8207 [UMET]
Titre de la revue :
Journal of Alloys and Compounds
Numéro :
758
Pagination :
148-161
Date de publication :
2018
Discipline(s) HAL :
Sciences de l'ingénieur [physics]/Matériaux
Sciences de l'ingénieur [physics]/Génie des procédés
Chimie/Matériaux
Chimie/Polymères
Sciences de l'ingénieur [physics]/Génie des procédés
Chimie/Matériaux
Chimie/Polymères
Résumé en anglais : [en]
Organosilicon films were deposited on carbon steel using plasma enhanced chemical vapour deposition (PECVD) process prepared from cold plasma polymerization of 1,1,3,3-tetramethyldisiloxane (TMDSO). The experimental design ...
Lire la suite >Organosilicon films were deposited on carbon steel using plasma enhanced chemical vapour deposition (PECVD) process prepared from cold plasma polymerization of 1,1,3,3-tetramethyldisiloxane (TMDSO). The experimental design technique allowed determining the optimal conditions of the plasma process. The effect of different surface pretreatments was investigated using amorphous phosphatation, argon (Ar) and nitrogen (N2) plasma. Coatings showing a hydrophobic character and good adhesion were obtained. Several surface characterization techniques using Fourier transform infrared spectroscopy (FTIR), nuclear magnetic resonance (NMR), scanning electron microscopy (SEM), contact angle, cross-cut and surface profilometry were used. The protection efficiency against corrosion of the deposited films has been demonstrated by coupling different electrochemical techniques such as open circuit potential (OCP) and electrochemical impedance spectroscopy (EIS) in 3 wt% NaCl solution. The organosilicon coatings showed good barrier against corrosion even after long immersion time in the aggressive environment, especially when N2 plasma pretreatment is performed.Lire moins >
Lire la suite >Organosilicon films were deposited on carbon steel using plasma enhanced chemical vapour deposition (PECVD) process prepared from cold plasma polymerization of 1,1,3,3-tetramethyldisiloxane (TMDSO). The experimental design technique allowed determining the optimal conditions of the plasma process. The effect of different surface pretreatments was investigated using amorphous phosphatation, argon (Ar) and nitrogen (N2) plasma. Coatings showing a hydrophobic character and good adhesion were obtained. Several surface characterization techniques using Fourier transform infrared spectroscopy (FTIR), nuclear magnetic resonance (NMR), scanning electron microscopy (SEM), contact angle, cross-cut and surface profilometry were used. The protection efficiency against corrosion of the deposited films has been demonstrated by coupling different electrochemical techniques such as open circuit potential (OCP) and electrochemical impedance spectroscopy (EIS) in 3 wt% NaCl solution. The organosilicon coatings showed good barrier against corrosion even after long immersion time in the aggressive environment, especially when N2 plasma pretreatment is performed.Lire moins >
Langue :
Anglais
Audience :
Internationale
Vulgarisation :
Non
Établissement(s) :
Université de Lille
ENSCL
CNRS
INRA
ENSCL
CNRS
INRA
Collections :
Équipe(s) de recherche :
Ingénierie des Systèmes Polymères
Date de dépôt :
2019-05-17T09:25:12Z
2023-12-19T16:26:02Z
2023-12-19T16:26:02Z