Photo-hardenable and patternable PDMS/SU-8 ...
Document type :
Compte-rendu et recension critique d'ouvrage
DOI :
Title :
Photo-hardenable and patternable PDMS/SU-8 hybrid functional material: A smart substrate for flexible systems
Author(s) :
Seghir, Rian [Auteur]
Laboratoire de Mécanique de Lille - FRE 3723 [LML]
Arscott, Steve [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Nano and Microsystems - IEMN [NAM6 - IEMN]
Laboratoire de Mécanique de Lille - FRE 3723 [LML]
Arscott, Steve [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Nano and Microsystems - IEMN [NAM6 - IEMN]
Journal title :
Journal of Polymer Science Part B: Polymer Physics
Pages :
1281-1291
Publisher :
Wiley
Publication date :
2015-09-15
ISSN :
0887-6266
English keyword(s) :
elastomers
heterogeneous polymers
lithography
mechanical properties
mixing
molding
photopolymerization
photoresists
stiffness
strain
stress
heterogeneous polymers
lithography
mechanical properties
mixing
molding
photopolymerization
photoresists
stiffness
strain
stress
HAL domain(s) :
Sciences de l'ingénieur [physics]
English abstract : [en]
The fabrication of flexible electronics and systems, using rigid and brittle materials directly produced on stretchable substrate, leads to some issues and incompatibilities. These include rigidity for processing and modular ...
Show more >The fabrication of flexible electronics and systems, using rigid and brittle materials directly produced on stretchable substrate, leads to some issues and incompatibilities. These include rigidity for processing and modular flexibility for applications, macroscopic flexibility, and local rigidity to shield components from strain, compatibility with technological steps, and at the same time allowing patterning and machining. The development of smart substrate materials which meet such needs is therefore a promising route for flexible systems. Here, we demonstrate that by mixing polydimethylsiloxane (PDMS) and SU-8 photoresist, we obtain both a photo-hardenable and patternable stretchable hybrid material. A set of PDMS/SU-8 and baking process combinations have been tested to determine an effective photo-sensitive mixture. A standard photolithographic approach has been used on tensile test samples demonstrating a local hardening of millimeter-sized ultraviolet exposed features and a local strain reduction reaching 35%. In addition, surface topography analysis and wet-etching techniques have been used to demonstrate a light-induced molding process and a selective etching of micrometer-sized ultraviolet exposed patterns. The combined functional properties of the following material, its simplicity of implementation, and the well-known assets of PDMS and SU-8 make the PDMS/SU-8 material very interesting and promising for various applications, especially stretchable systems.Show less >
Show more >The fabrication of flexible electronics and systems, using rigid and brittle materials directly produced on stretchable substrate, leads to some issues and incompatibilities. These include rigidity for processing and modular flexibility for applications, macroscopic flexibility, and local rigidity to shield components from strain, compatibility with technological steps, and at the same time allowing patterning and machining. The development of smart substrate materials which meet such needs is therefore a promising route for flexible systems. Here, we demonstrate that by mixing polydimethylsiloxane (PDMS) and SU-8 photoresist, we obtain both a photo-hardenable and patternable stretchable hybrid material. A set of PDMS/SU-8 and baking process combinations have been tested to determine an effective photo-sensitive mixture. A standard photolithographic approach has been used on tensile test samples demonstrating a local hardening of millimeter-sized ultraviolet exposed features and a local strain reduction reaching 35%. In addition, surface topography analysis and wet-etching techniques have been used to demonstrate a light-induced molding process and a selective etching of micrometer-sized ultraviolet exposed patterns. The combined functional properties of the following material, its simplicity of implementation, and the well-known assets of PDMS and SU-8 make the PDMS/SU-8 material very interesting and promising for various applications, especially stretchable systems.Show less >
Language :
Anglais
Popular science :
Non
Source :
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