Controlled mud-crack patterning and ...
Type de document :
Compte-rendu et recension critique d'ouvrage
DOI :
Titre :
Controlled mud-crack patterning and self-organized cracking of polydimethylsiloxane elastomer surfaces
Auteur(s) :
Seghir, Rian [Auteur]
Laboratoire de Mécanique de Lille - FRE 3723 [LML]
Arscott, Steve [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Nano and Microsystems - IEMN [NAM6 - IEMN]
Laboratoire de Mécanique de Lille - FRE 3723 [LML]
Arscott, Steve [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Nano and Microsystems - IEMN [NAM6 - IEMN]
Titre de la revue :
SCIENTIFIC REPORTS
Éditeur :
Nature Publishing Group
Date de publication :
2015-12
ISSN :
2045-2322
Discipline(s) HAL :
Sciences de l'ingénieur [physics]
Résumé en anglais : [en]
Exploiting pattern formation – such as that observed in nature – in the context of micro/nanotechnology could have great benefits if coupled with the traditional top-down lithographic approach. Here, we demonstrate an ...
Lire la suite >Exploiting pattern formation – such as that observed in nature – in the context of micro/nanotechnology could have great benefits if coupled with the traditional top-down lithographic approach. Here, we demonstrate an original and simple method to produce unique, localized and controllable self-organised patterns on elastomeric films. A thin, brittle silica-like crust is formed on the surface of polydimethylsiloxane (PDMS) using oxygen plasma. This crust is subsequently cracked via the deposition of a thin metal film – having residual tensile stress. The density of the mud-crack patterns depends on the plasma dose and on the metal thickness. The mud-crack patterning can be controlled depending on the thickness and shape of the metallization – ultimately leading to regularly spaced cracks and/or metal mesa structures. Such patterning of the cracks indicates a level of self-organization in the structuring and layout of the features – arrived at simply by imposing metallization boundaries in proximity to each other, separated by a distance of the order of the critical dimension of the pattern size apparent in the large surface mud-crack patterns.Lire moins >
Lire la suite >Exploiting pattern formation – such as that observed in nature – in the context of micro/nanotechnology could have great benefits if coupled with the traditional top-down lithographic approach. Here, we demonstrate an original and simple method to produce unique, localized and controllable self-organised patterns on elastomeric films. A thin, brittle silica-like crust is formed on the surface of polydimethylsiloxane (PDMS) using oxygen plasma. This crust is subsequently cracked via the deposition of a thin metal film – having residual tensile stress. The density of the mud-crack patterns depends on the plasma dose and on the metal thickness. The mud-crack patterning can be controlled depending on the thickness and shape of the metallization – ultimately leading to regularly spaced cracks and/or metal mesa structures. Such patterning of the cracks indicates a level of self-organization in the structuring and layout of the features – arrived at simply by imposing metallization boundaries in proximity to each other, separated by a distance of the order of the critical dimension of the pattern size apparent in the large surface mud-crack patterns.Lire moins >
Langue :
Anglais
Vulgarisation :
Non
Source :
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- https://www.nature.com/articles/srep14787.pdf
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- https://www.ncbi.nlm.nih.gov/pmc/articles/PMC4594096/pdf
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