Structural and optical properties of ...
Type de document :
Compte-rendu et recension critique d'ouvrage
Titre :
Structural and optical properties of RF-biased PECVD TiO2 thin films deposited in an O2/TTIP helicon reactor
Auteur(s) :
Li, D. [Auteur]
Goullet, A. [Auteur]
Institut des Matériaux Jean Rouxel [IMN]
Carette, Michèle [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Granier, A. [Auteur]
Zhang, Y. [Auteur]
Landesman, Jean-Pierre [Auteur]
Institut de Physique de Rennes [IPR]
Goullet, A. [Auteur]
Institut des Matériaux Jean Rouxel [IMN]
Carette, Michèle [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Granier, A. [Auteur]
Zhang, Y. [Auteur]
Landesman, Jean-Pierre [Auteur]
Institut de Physique de Rennes [IPR]
Titre de la revue :
Vacuum
Pagination :
231-239
Éditeur :
Elsevier
Date de publication :
2016
ISSN :
0042-207X
Discipline(s) HAL :
Physique [physics]
Sciences de l'ingénieur [physics]
Sciences de l'ingénieur [physics]
Résumé en anglais : [en]
TiO2 thin films are deposited from oxygen/titanium tetraisopropoxide inductively coupled radiofrequency plasmas at low temperature and pressure by a RF-biased PECVD technique. In such a process, the substrate biasing effect ...
Lire la suite >TiO2 thin films are deposited from oxygen/titanium tetraisopropoxide inductively coupled radiofrequency plasmas at low temperature and pressure by a RF-biased PECVD technique. In such a process, the substrate biasing effect (Vb) on the related film composition, structure, morphology, and optical properties are investigated. The results show that the O:Ti concentration ratio in all the films is roughly in stoichiometric proportion of 2, and the binding energy difference between the O 1s and Ti 2p3/2 levels indicates the formal valence state Ti4+ in all the films. The phase transformation from anatase to rutile is identified by Raman spectroscopy. At the floating potential, the first growth stage yields a well organized columnar layer, ∼90 nm in thickness, and this layer within a thick film (∼365 nm) has roughly the same optical properties as the thin film of ∼90 nm which is separately deposited. However, the columnar structure can be eliminated by using |Vb| ≧ 50 V. Spectroscopic ellipsometry is used to obtain the film optical properties, and appropriate fitting parameters have been found for the measured data. © 2016 Elsevier LtdLire moins >
Lire la suite >TiO2 thin films are deposited from oxygen/titanium tetraisopropoxide inductively coupled radiofrequency plasmas at low temperature and pressure by a RF-biased PECVD technique. In such a process, the substrate biasing effect (Vb) on the related film composition, structure, morphology, and optical properties are investigated. The results show that the O:Ti concentration ratio in all the films is roughly in stoichiometric proportion of 2, and the binding energy difference between the O 1s and Ti 2p3/2 levels indicates the formal valence state Ti4+ in all the films. The phase transformation from anatase to rutile is identified by Raman spectroscopy. At the floating potential, the first growth stage yields a well organized columnar layer, ∼90 nm in thickness, and this layer within a thick film (∼365 nm) has roughly the same optical properties as the thin film of ∼90 nm which is separately deposited. However, the columnar structure can be eliminated by using |Vb| ≧ 50 V. Spectroscopic ellipsometry is used to obtain the film optical properties, and appropriate fitting parameters have been found for the measured data. © 2016 Elsevier LtdLire moins >
Langue :
Anglais
Vulgarisation :
Non
Source :