Influence of Ga doping on the microstructure ...
Document type :
Article dans une revue scientifique
DOI :
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Title :
Influence of Ga doping on the microstructure of 3C-SiC layers grown on 4H-SiC substrates by VLS mechanism
Author(s) :
Marinova, Maya [Auteur]
Department of Physics [Thessaloniki]
Mantzari, Alkyoni [Auteur]
Department of Physics [Thessaloniki]
Andreadou, Ariadne [Auteur]
Department of Physics [Thessaloniki]
Lorenzzi, Jean [Auteur]
Laboratoire des Multimatériaux et Interfaces [LMI]
Ferro, Gabriel [Auteur]
Laboratoire des Multimatériaux et Interfaces [LMI]
Polychroniadis, Efstathios K. [Auteur]
Department of Physics [Thessaloniki]
Department of Physics [Thessaloniki]
Mantzari, Alkyoni [Auteur]
Department of Physics [Thessaloniki]
Andreadou, Ariadne [Auteur]
Department of Physics [Thessaloniki]
Lorenzzi, Jean [Auteur]
Laboratoire des Multimatériaux et Interfaces [LMI]
Ferro, Gabriel [Auteur]
Laboratoire des Multimatériaux et Interfaces [LMI]
Polychroniadis, Efstathios K. [Auteur]
Department of Physics [Thessaloniki]
Journal title :
Physica Status Solidi (c)
Volume number :
10
Pages :
72-75
Publication date :
2013
HAL domain(s) :
Chimie/Matériaux
English abstract : [en]
This work focuses on the Transmission Electron Microscopy investigation of p‐type doped 3C‐SiC layers grown by Vapor‐Liquid‐Solid mechanism using Si‐Ga melts on 4H‐SiC substrates. Ga concentration strongly influences the ...
Show more >This work focuses on the Transmission Electron Microscopy investigation of p‐type doped 3C‐SiC layers grown by Vapor‐Liquid‐Solid mechanism using Si‐Ga melts on 4H‐SiC substrates. Ga concentration strongly influences the appearance of defects in the grown layers. Ga inclusions are observed only in the layer grown at the highest temperature and lowest Ga content in the melt. At the highest concentration of Ga in the melt main defects are dislocations forming periodic bands along 〈equation image〉 and 〈equation image〉 directions. The most appropriate conditions (in terms of defect density) for VLS growth using SiGa melts, as defined from the current study, should be growth in Si25Ga75 alloy at T = 1200 ºC.Show less >
Show more >This work focuses on the Transmission Electron Microscopy investigation of p‐type doped 3C‐SiC layers grown by Vapor‐Liquid‐Solid mechanism using Si‐Ga melts on 4H‐SiC substrates. Ga concentration strongly influences the appearance of defects in the grown layers. Ga inclusions are observed only in the layer grown at the highest temperature and lowest Ga content in the melt. At the highest concentration of Ga in the melt main defects are dislocations forming periodic bands along 〈equation image〉 and 〈equation image〉 directions. The most appropriate conditions (in terms of defect density) for VLS growth using SiGa melts, as defined from the current study, should be growth in Si25Ga75 alloy at T = 1200 ºC.Show less >
Language :
Anglais
Peer reviewed article :
Oui
Audience :
Internationale
Popular science :
Non
European Project :
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Submission date :
2019-06-17T08:43:24Z
2020-03-17T16:35:39Z
2020-03-17T16:35:39Z