Thermal characterization of Ge-rich GST ...
Type de document :
Compte-rendu et recension critique d'ouvrage
DOI :
URL permanente :
Titre :
Thermal characterization of Ge-rich GST thin films for phase change memories by Raman thermometry
Auteur(s) :
Patil, Akash [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Microélectronique Silicium - IEMN [MICROELEC SI - IEMN]
Le-Friec, Yannick [Auteur]
STMicroelectronics [Crolles] [ST-CROLLES]
Roussel, Pascal [Auteur]
Unité de Catalyse et Chimie du Solide - UMR 8181 [UCCS]
Deblock, Yves [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Jeannot, Simon [Auteur]
STMicroelectronics [Crolles] [ST-CROLLES]
Boivin, Philippe [Auteur]
STMicroelectronics [Rousset] [ST-ROUSSET]
Dubois, Emmanuel [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Microélectronique Silicium - IEMN [MICROELEC SI - IEMN]
Robillard, Jean-François [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Microélectronique Silicium - IEMN [MICROELEC SI - IEMN]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Microélectronique Silicium - IEMN [MICROELEC SI - IEMN]
Le-Friec, Yannick [Auteur]
STMicroelectronics [Crolles] [ST-CROLLES]
Roussel, Pascal [Auteur]

Unité de Catalyse et Chimie du Solide - UMR 8181 [UCCS]
Deblock, Yves [Auteur]

Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Jeannot, Simon [Auteur]
STMicroelectronics [Crolles] [ST-CROLLES]
Boivin, Philippe [Auteur]
STMicroelectronics [Rousset] [ST-ROUSSET]
Dubois, Emmanuel [Auteur]

Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Microélectronique Silicium - IEMN [MICROELEC SI - IEMN]
Robillard, Jean-François [Auteur]

Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Microélectronique Silicium - IEMN [MICROELEC SI - IEMN]
Titre de la revue :
Journal of Applied Physics
Éditeur :
American Institute of Physics
Date de publication :
2024-11-01
ISSN :
0021-8979
Mot(s)-clé(s) en anglais :
CrossMark
Discipline(s) HAL :
Sciences de l'ingénieur [physics]
Résumé en anglais : [en]
<div><p>Doped GeSbTe (GST)-based phase change materials are of growing interest due to their ability to enable high-temperature data retention for embedded memory applications. This functionality is achieved through Ge ...
Lire la suite ><div><p>Doped GeSbTe (GST)-based phase change materials are of growing interest due to their ability to enable high-temperature data retention for embedded memory applications. This functionality is achieved through Ge enrichment and addition of dopants such as N and C in stoichiometries such as GST-225, which improve the crystallization temperature and thermal phase stability. In this study, we examine the effect of these dopants on thermal conductivity using Raman thermometry. We report the temperature-dependent thermal conductivity of the amorphous and crystalline phases of Ge-rich GeSbTe (GGST) and Ge-rich GeSbTe N-doped (GGSTN) thin films. The results reveal a surprising temperature dependence of the thermal conductivity of the crystalline phase of GGST and GGSTN, a phenomenon not typically observed for GST-based materials. Additionally, enrichment of Ge and subsequent N-doping result in reduced thermal conductivity, which can benefit the power consumption of phase change memories. From a characterization perspective, Raman thermometry has been developed as a technique for simultaneous structural and thermal characterization of GST-based materials.</p></div>Lire moins >
Lire la suite ><div><p>Doped GeSbTe (GST)-based phase change materials are of growing interest due to their ability to enable high-temperature data retention for embedded memory applications. This functionality is achieved through Ge enrichment and addition of dopants such as N and C in stoichiometries such as GST-225, which improve the crystallization temperature and thermal phase stability. In this study, we examine the effect of these dopants on thermal conductivity using Raman thermometry. We report the temperature-dependent thermal conductivity of the amorphous and crystalline phases of Ge-rich GeSbTe (GGST) and Ge-rich GeSbTe N-doped (GGSTN) thin films. The results reveal a surprising temperature dependence of the thermal conductivity of the crystalline phase of GGST and GGSTN, a phenomenon not typically observed for GST-based materials. Additionally, enrichment of Ge and subsequent N-doping result in reduced thermal conductivity, which can benefit the power consumption of phase change memories. From a characterization perspective, Raman thermometry has been developed as a technique for simultaneous structural and thermal characterization of GST-based materials.</p></div>Lire moins >
Langue :
Anglais
Vulgarisation :
Non
Projet Européen :
Source :
Date de dépôt :
2024-11-07T06:24:03Z
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