Titre :

Mechanical properties of porous silicon and oxidized porous silicon by nanoindentation technique

Auteur(s) :

Fakiri, Souheyla [Auteur]
Unité de Recherche Matériaux et Energies Renouvelables [URMER]
Montagne, Alex [Auteur]
Mechanics surfaces and materials processing [MSMP]
Rahmoun, Khadidja [Auteur]
Université Aboubekr Belkaid - University of Belkaïd Abou Bekr [Tlemcen]
Iost, Alain [Auteur]
Mechanics surfaces and materials processing [MSMP]
Ziouche, Katir [Auteur]
WIde baNd gap materials and Devices - IEMN [WIND - IEMN]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]

Titre de la revue :

Materials Science and Engineering: A

Pagination :

470-475

Éditeur :

Elsevier

Date de publication :

2018

ISSN :

0921-5093

Discipline(s) HAL :

Sciences de l'ingénieur [physics]

Résumé en anglais : [en]

A study of mechanical properties of mesoporous silicon (PS) is presented in this article. PS was prepared by electrochemical etching of a heavily doped P++ silicon wafer in a hydrofluoric acid electrolyte. The mechanical ...
Lire la suite >A study of mechanical properties of mesoporous silicon (PS) is presented in this article. PS was prepared by electrochemical etching of a heavily doped P++ silicon wafer in a hydrofluoric acid electrolyte. The mechanical properties of PS and oxidized PS obtained by thermal treatment, were characterized by the nanoindentation technique associated to the continuous stiffness measurement option. The morphology of PS and oxidized PS were both characterized by scanning electron microscope. It is shown that the Young's modulus and hardness are related to the PS preparing conditions and decrease with increasing porosity. In particular, oxidation improves the mechanical properties of the mesoporous silicon. Surprisingly, modulus and hardness decrease with penetration depth, whereas a compaction could be expected resulting in a rising modulus and hardness. These results are mainly attributed to micro cracks formation, highlighted by focused ion beam cross section.Lire moins >

Langue :

Anglais

Comité de lecture :

Oui

Audience :

Internationale

Vulgarisation :

Non

Collections :

• Institut d'Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520

Source :

Harvested from HAL