Raman characterization of Ar+ ion-implanted GaN
Type de document :
Article dans une revue scientifique
DOI :
Titre :
Raman characterization of Ar+ ion-implanted GaN
Auteur(s) :
Boudart, B. [Auteur]
Guhel, Y. [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Pesant, J. C. [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Dhamelincourt, P. [Auteur]
Centre d'Etudes et de Recherches Lasers et Applications [CERLA]
Poisson, M. A. [Auteur]
Guhel, Y. [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Pesant, J. C. [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Dhamelincourt, P. [Auteur]
Centre d'Etudes et de Recherches Lasers et Applications [CERLA]
Poisson, M. A. [Auteur]
Titre de la revue :
Journal of Raman Spectroscopy
Pagination :
283-286
Éditeur :
Wiley
Date de publication :
2002-04
ISSN :
0377-0486
Discipline(s) HAL :
Sciences de l'ingénieur [physics]
Résumé en anglais : [en]
Ar+ ions were implanted at room temperature in n-type hexagonal GaN for device isolation purpose. We performed electrical measurements and resonance Raman spectroscopy in order to monitor the electrical and structural ...
Lire la suite >Ar+ ions were implanted at room temperature in n-type hexagonal GaN for device isolation purpose. We performed electrical measurements and resonance Raman spectroscopy in order to monitor the electrical and structural changes of non-annealed and annealed implanted GaN samples. On increasing the implantation dose from 3.4 × 1012 to 3.4 × 1014 ions cm−2, an increase in the electrical isolation and a decrease in the photoluminescence were observed. For a 1016 ions cm−2 dose, the implanted layer became conductive owing to a hopping mechanism and only the first-order phonon lines remained observable. After annealing at 900 °C for 30 s, the implanted samples became conductive and the photoluminescence reappeared or increased compared with the non-annealed samples at same implantation doses, except for the sample implanted at the highest dose, which became insulating.Lire moins >
Lire la suite >Ar+ ions were implanted at room temperature in n-type hexagonal GaN for device isolation purpose. We performed electrical measurements and resonance Raman spectroscopy in order to monitor the electrical and structural changes of non-annealed and annealed implanted GaN samples. On increasing the implantation dose from 3.4 × 1012 to 3.4 × 1014 ions cm−2, an increase in the electrical isolation and a decrease in the photoluminescence were observed. For a 1016 ions cm−2 dose, the implanted layer became conductive owing to a hopping mechanism and only the first-order phonon lines remained observable. After annealing at 900 °C for 30 s, the implanted samples became conductive and the photoluminescence reappeared or increased compared with the non-annealed samples at same implantation doses, except for the sample implanted at the highest dose, which became insulating.Lire moins >
Langue :
Anglais
Comité de lecture :
Oui
Audience :
Internationale
Vulgarisation :
Non
Source :
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