Micromachined high-frequency ZnO ultrasonic linear arrays

Zhang, Jin-Ying; Xu, Wei Jiang; Han, G.; Carlier, Julien; Ji, X.M.; Chen, S.M.; Xu, B.

Document type :

Communication dans un congrès avec actes

DOI :

10.1109/ULTSYM.2013.0133

Title :

Micromachined high-frequency ZnO ultrasonic linear arrays

Author(s) :

Zhang, Jin-Ying [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Xu, Wei Jiang [Auteur]

Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Han, G. [Auteur]
Carlier, Julien [Auteur]

Matériaux et Acoustiques pour MIcro et NAno systèmes intégrés - IEMN [MAMINA - IEMN]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Ji, X.M. [Auteur]
Chen, S.M. [Auteur]
Xu, B. [Auteur]

Conference title :

IEEE International Ultrasonics Symposium, IUS 2013

City :

Prague

Country :

République tchèque

Start date of the conference :

2013

Book title :

Proceedings of 2013 IEEE International Ultrasonics Symposium, IUS 2013

Publication date :

2013

English keyword(s) :

high frequency
ultrasonic linear array
ZnO film
wet etching
finite element method

HAL domain(s) :

Sciences de l'ingénieur [physics]

English abstract : [en]

ZnO thin film has been widely applied in highfrequency acoustic microscopy using single element transducer. It needs mechanical scanning which is much more timeconsuming than electronic scanning with transducer array. ...
Show more >ZnO thin film has been widely applied in highfrequency acoustic microscopy using single element transducer. It needs mechanical scanning which is much more timeconsuming than electronic scanning with transducer array. However, one of the challenges in the implementation of ZnO transducer array is the patterning of small scale features in the array elements. In this paper, a controllable wet-chemical etching method is investigated to fabricate high-frequency ZnO-based ultrasonic transducer arrays. The wet-chemical etchant is NH4Cl aqueous solution with a concentration of 10 wt% and the etching rate is 53 nm/min at room temperature. A ZnO array is achieved with a small ratio (0.25) of lateral etching to vertical etching. Finite element method is employed to calculate acoustic field, electrical impedance and crosstalk of the transducer. The characteristics of the transducer are measured and compared to the theoretical predictions. This etching method provides a possibility to acquire a pitch of a λ in a 300 MHz array. It indicates that the proposed wet etching is promising in the fabrication of high-frequency ZnO transducer arrays.Show less >

Language :

Anglais

Peer reviewed article :

Oui

Audience :

Non spécifiée

Popular science :

Non

Collections :

Institut d'Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520

Source :

Harvested from HAL

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