Chemical stability of caesium iodide deposits in air/steam atmosphere

OBADA, Dorel; HIJAZI, Houssam; Paul, Jean-François; Gasnot, Laurent; GREGOIRE, Anne Cecile; MAMEDE, Anne Sophie; Cantrel, Laurent

Document type :

Article dans une revue scientifique

DOI :

10.1016/j.jhazmat.2020.124519

Permalink :

http://hdl.handle.net/20.500.12210/59357

Title :

Chemical stability of caesium iodide deposits in air/steam atmosphere

Author(s) :

OBADA, Dorel [Auteur]
HIJAZI, Houssam [Auteur]
Paul, Jean-François [Auteur]
Gasnot, Laurent [Auteur]

GREGOIRE, Anne Cecile [Auteur]
MAMEDE, Anne Sophie [Auteur]
Cantrel, Laurent [Auteur]

Journal title :

Journal of Hazardous Materials

Pages :

124519

Publisher :

Elsevier

Publication date :

2020

ISSN :

0304-3894

HAL domain(s) :

Chimie

English abstract : [en]

Iodine compounds that may be released in case of severe nuclear accident will have important radiotoxicity if they are disseminated in air. One of the most important iodine species is CsI that is deposited on the surfaces ...
Show more >Iodine compounds that may be released in case of severe nuclear accident will have important radiotoxicity if they are disseminated in air. One of the most important iodine species is CsI that is deposited on the surfaces of the reactor coolant system. However, depending on the conditions, CsI can volatilize or react with oxidants to produce I2(g). Theoretical and experimental studies demonstrate that oxidation of iodide depends on the temperature and in the presence of oxidants in the gas. It is also slightly influenced by the crystallinity of the CsI particles and the nature of the support. In case of a high temperature deposition, the iodine release started at temperature lower than 300°C. For the CsI vapour and aerosol depositions, the iodine is detected only at temperature above 450 °C and become very important above 550 °C.Show less >

Language :

Anglais

Peer reviewed article :

Oui

Audience :

Internationale

Popular science :

Non

Collections :

Institut d'Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520

Source :

Harvested from HAL

Submission date :

2022-01-25T05:01:26Z

Files

https://hal.archives-ouvertes.fr/hal-03539663/document
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