Titre :

Current-voltage characteristics of (Mo/Au)/AlGaN/GaN/Si Schottky diodes

Auteur(s) :

Mosbahi, H. [Auteur]
Charfeddine, M. [Auteur]
Gassoumi, M. [Auteur]
Gaquiere, Christophe [Auteur]
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 [IEMN]
Zaidi, M.A. [Auteur]
Maaref, H. [Auteur]

Titre de la manifestation scientifique :

European Materials Research Society Spring Meeting, E-MRS Spring 2014, Symposium X - Materials research for group IV semiconductors : growth, characterization and technological developments

Ville :

Lille

Pays :

France

Date de début de la manifestation scientifique :

2014

Résumé en anglais : [en]

The AlGaN/GaN high electron mobility transistors (HEMTs) is a promising candidate for microwave applications due to its high power and high temperature. owing to their large and direct band gap, as well as favorable transport ...
Lire la suite >The AlGaN/GaN high electron mobility transistors (HEMTs) is a promising candidate for microwave applications due to its high power and high temperature. owing to their large and direct band gap, as well as favorable transport properties. Moreover, III-V nitrides could be suitable for the emitters and detectors of green and shorter wavelengths, in turn making investments in this class of materials more than worthwhile. The electrical characteristics of metal contactst on-GaN have been examined by numerous research groups. The mechanism of leakage currents through GaN and AlGaN Schottky interfaces is discussed using temperature- dependent current-voltage (I-V-T) measurements, and found that the barrier thinning caused by unintentional surface-defect donors enhances the tunneling transport processes, leading to large leakage currents through GaN and AlGaN Schottky interfaces. Key world: AlGaN/GaN, HEMTs, I-V, Schottky barrier height, Barrier inhomogeneity.Lire moins >

Langue :

Anglais

Comité de lecture :

Oui

Audience :

Non spécifiée

Vulgarisation :

Non

Collections :

• Institut d'Électronique, de Microélectronique et de Nanotechnologie (IEMN) - UMR 8520

Source :

Harvested from HAL